ADHESION ADHESIVES&SEALANTS

, Volume 10, Issue 4, pp 22–27 | Cite as

Ultra high-resolution imaging of interface layers

Combination of ion beam milled cross sections and modern field emission scanning electron microscopy
  • Jens Holtmannspötter
  • Michael Wetzel
  • Jürgen von Czarnecki
  • Rolf Brucksch
Research and Development
  • 11 Downloads

References

  1. [1]
    Goldstein, J.: “Scanning Electron Microscopy and X-Ray Microanalysis”, 3rd issue, Kluwer Academic, 2003CrossRefGoogle Scholar
  2. [2]
    Rousel, L. Y. et al.: “Extreme high resolution scanning electron microscopy (XHR SEM) and beyond”, Scanning Microscopy 2009Google Scholar
  3. [3]
    Erdmann, N. et al.: “Precise SEM Cross Section Polishing via Argon Beam Milling”, Microscopy Today, Mai 2006Google Scholar

Copyright information

© Springer Fachmedien Wiesbaden 2013

Authors and Affiliations

  • Jens Holtmannspötter
    • 1
  • Michael Wetzel
    • 1
  • Jürgen von Czarnecki
    • 1
  • Rolf Brucksch
    • 1
  1. 1.MunichGermany

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