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Time-modulated CVD process optimized using the taguchi method

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Abstract

The Taguchi method is used herein to optimize the time-modulated chemical vapor deposition (TMCVD) process. TMCVD can be used to deposit smooth, nanocrystalline diamond (NCD) coatings onto a range of substrate materials. The implementation of the Taguchi method to optimize the TMCVD process can save time, effort, and money. The Taguchi method significantly reduces the number of experiments required to optimize a fabrication process. In this study, the effect of five TMCVD process parameters is investigated with respect to five key factors of the as-grown samples. Each parameter was varied at four different values (experimental levels). The five key factors, taking into consideration the experimental levels, were optimized after performing only 16 experiments. The as-grown films were characterized for hardness, quality, surface roughness, and microstructure using scanning electron microscopy, Raman spectroscopy, surface profilometry, and Vickers hardness testing.

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Authors and Affiliations

  1. Dalton Research Institute, Manchester Metropolitan University, Chester Street, M1 5GD, Manchester, U.K.

    W. Ahmed, E. Ahmed & C. Maryan

  2. Birck Nanotechnology Center, Purdue University, 47907, West Lafayette, IN

    M. J. Jackson

  3. Thin Films Centre, University of Paisley, Paisley, Scotland, U.K.

    A. A. Ogwu

  4. Department of Mechanical Engineering, University of Aveiro, 3810-193, Aveiro, Portugal

    N. Ali, V. F. Neto & J. Gracio

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  1. W. Ahmed
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  2. E. Ahmed
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  3. C. Maryan
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  4. M. J. Jackson
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  5. A. A. Ogwu
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  6. N. Ali
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  7. V. F. Neto
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  8. J. Gracio
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Ahmed, W., Ahmed, E., Maryan, C. et al. Time-modulated CVD process optimized using the taguchi method. J. of Materi Eng and Perform 15, 236–241 (2006). https://doi.org/10.1361/105994906X95940

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  • DOI: https://doi.org/10.1361/105994906X95940

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