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Uniformity pattern and related criteria for two-level factorials

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Abstract

In this paper, the study of projection properties of two-level factorials in view of geometry is reported. The concept of uniformity pattern is defined. Based on this new concept, criteria of uniformity resolution and minimum projection uniformity are proposed for comparing two-level factorials. Relationship between minimum projection uniformity and other criteria such as minimum aberration, generalized minimum aberration and orthogonality is made explict. This close relationship raises the hope of improving the connection between uniform design theory and factorial design theory. Our results provide a justification of orthogonality, minimum aberration, and generalized minimum aberration from a natural geometrical interpretation.

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Correspondence to Kaitai Fang or Hong Qin.

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Fang, K., Qin, H. Uniformity pattern and related criteria for two-level factorials. Sci. China Ser. A-Math. 48, 1–11 (2005). https://doi.org/10.1360/03ys0155

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  • DOI: https://doi.org/10.1360/03ys0155

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