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Structured electrodeposition in magnetic gradient fields

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Abstract

Electrodeposition in superimposed magnetic gradient fields is a new and promising method of structuring metal deposits while avoiding masking techniques. The magnetic properties of the ions involved, their concentrations, the electrochemical deposition parameters, and the amplitude of the applied magnetic gradient field determine the structure generated. This structure can be thicker in regions of high magnetic field gradients. It can also be free-standing or inversely structured. The complex mechanism of structured electrodeposition of metallic layers in superimposed magnetic gradient fields was studied by different experimental methods, by analytical methods and by numerical simulation and will be discussed comprehensively.

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Authors and Affiliations

  1. IFW Dresden, PO Box 270016, 01171, Dresden, Germany

    Margitta Uhlemann, Kristina Tschulik & Annett Gebert

  2. Inst. Fluid Dynamics, Technische Universität Dresden, 01062, Dresden, Germany

    Gerd Mutschke, Jochen Fröhlich, Xuegeng Yang & Kerstin Eckert

  3. Dept. of Chemistry, Oxford University, Oxford, OX1 3QZ, UK

    Kristina Tschulik

  4. Inst. Fluid Dynamics, Helmholtz-Zentrum Dresden-Rossendorf, 01314, Dresden, Germany

    Gerd Mutschke

  5. Inst. Electrochem. Electroplating, Ilmenau University of Technology, 98693, Ilmenau, Germany

    Andreas Bund

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  1. Margitta Uhlemann
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Correspondence to Margitta Uhlemann.

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Uhlemann, M., Tschulik, K., Gebert, A. et al. Structured electrodeposition in magnetic gradient fields. Eur. Phys. J. Spec. Top. 220, 287–302 (2013). https://doi.org/10.1140/epjst/e2013-01814-3

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  • DOI: https://doi.org/10.1140/epjst/e2013-01814-3

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