Receding contact lines: From sliding drops to immersion lithography
Instabilities of receding contact lines often occur through the formation of a corner with a very sharp tip. These dewetting structures also appear in the technology of Immersion Lithography, where water is put between the lens and the silicon wafer to increase the optical resolution. In this paper we aim to compare corners appearing in Immersion Lithography to those at the tail of gravity driven-drops sliding down an incline. We use high speed recordings to measure the dynamic contact angle and the sharpness of the corner, for varying contact line velocity. It is found that these quantities behave very similarly for Immersion Lithography and drops on an incline. In addition, the results agree well with predictions by a lubrication model for cornered contact lines, hinting at a generic structure of dewetting corners.
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- 2.J.C. Berg, Wettability (Marcel Dekker INC, New York, 1993), p. 318Google Scholar
- 6.B.V. Derjaguin, S.M. Levi, Film Coating Theory (Focal Press, London, 1964)Google Scholar
- 8.L.D. Landau, B.V. Levich, Acta Phys. URSS 17, 42 (1942)Google Scholar
- 18.J.H. Burnett, S.G. Kaplana, E.L. Shirleya, P.J. Tompkins, J.E. Webb, Proceedings of SPIE 5754, Optical Microlithography XVIIIGoogle Scholar
- 19.M. Riepen, F. Evangelista, S. Donders, Proceedings of the 1st European Conference on Microfluidics (2008)Google Scholar