Study of effective parameters on nanostructures growth by three-dimensional simulation

Abstract.

In this paper the Monte Carlo three-dimensional simulation method is used for Ni nanostructures growth. Nucleation stage and bulk growth are simulated. The Metropolis algorithm is used for applying the temperature effect. At the nucleation stage, the increasing substrate temperature causes reduction of island number and enhancement of island size. The Bulk growth model is assumed ballistic and the effect of the substrate size variation on the roughness is studied after termination of the bulk growth stage. The structure zone model is simulated and variations of grown column angle with respect to particles incidence angle is reviewed. Our results show that roughness variation is a function of substrate temperature and particles incidence angle. Our simulation shows that increasing the substrate temperature reduces the roughness. Also enhancement of particles incidence angle increases roughness and with increasing the substrate size, the roughness curve gets a sharp slope. With increasing the incidence angle, the shadowing length and void space become larger and the surface roughness increases as well.