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Double electromagnetically induced transparency medium for quantum lithography beyond diffraction limit

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Abstract

A method to carry out the sub-wavelength lithography using a double electromagnetically induced transparency system is proposed here. In order to realize the sub-wavelength pattern, spatial modulation of the coupling and driving fields, which control the double EIT, is introduced. The proposal does not require entanglement of fields and can be conveniently implemented with existing techniques.

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Authors and Affiliations

  1. Physics Department, Adelphi University Garden City, New York, 11530, USA

    Amitabh Joshi

  2. Department of Mathematics, Al-Azhar University, Faculty of Science, P.O. Box 11754, Nasr City, Cairo, Egypt

    Kariman I. Osman

Authors
  1. Amitabh Joshi
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  2. Kariman I. Osman
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Correspondence to Kariman I. Osman.

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Joshi, A., Osman, K. Double electromagnetically induced transparency medium for quantum lithography beyond diffraction limit. Eur. Phys. J. D 69, 267 (2015). https://doi.org/10.1140/epjd/e2015-60413-0

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  • DOI: https://doi.org/10.1140/epjd/e2015-60413-0

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