Quantum lithography on bound-free transitions
A new protocol for quantum lithography is presented. A formula which describes the single-quantum bound-free transition to the center of the continuous spectral zone under the action of two monochromatic photon beams is obtained. The derivation is based on the Markov approximation and takes into account all orders of the interaction parameter. The probabilities of bound-free transition for several initial field states are represented: N-photon, entangled N-photon and coherent states cases. The possibility of obtaining thin geometric structures on the surface of photoresist is discussed.
- 11.S.V. Zelentsov, N.V. Zelentsova, Photoresists, in The Marcel Dekker Encyclopedia of Chemical Technology (Taylor & Francis, New York, 2006), pp. 2111-2127Google Scholar
- 12.M.A. Elyashevich, Atomic and molecular spectroscopy, 2nd edn. (Editorial URSS, Moscow, 2001)Google Scholar
- 20.H. Carmichael, An Open Systems Approach to Quantum Optics (Springer-Verlag, Berlin, Heidelberg, New York, 1993)Google Scholar
- 22.L. Mandel, E. Wolf, Optical Coherence and Quantum Optics (Cambridge University Press, 1995), p. 897Google Scholar