Abstract
The influence of the unevenness of substrates immersed into plasma important for plasma-based treatment of materials were studied by computer experiment. The role of both substrate properties and plasma parameters was investigated. For this analysis the combination of multidimensional fluid modelling and particle simulation was used. The fluid part of our model consisted of continuity equations for all charged species, energy balance equation for electrons and Poisson equation. The basic scattering processes were also included. The particle simulation technique was used both for the calculation of electron energy distribution function and for the derivation of quantities characterising plasma-surface interaction. This approach enabled us to study in detail the structure of the sheath and presheath near metal substrates with realistic geometries and finite dimensions. The main attention was devoted to the influence of substrate geometry in both macroscopic and microscopic spatial scales on the local electric fields in plasma.
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References
L.M. Montierth, W.A. Neuman, R.L. Morse, Phys. Fluids B 4, 784 (1992)
J. Riemann, M. Borchardt, R. Schneider, A. Mutzke, T.D. Rognlien, M. Umansky, Contrib. Plasma Phys. 44, 35 (2004)
D. Trunec, P. Španěl, D. Smith, Contrib. Plasma Phys. 42, 91 (2002)
R. Hrach, V. Hrachová, M. Vicher, Comput. Phys. Commun. 147, 505 (2002)
A. Cenian, A. Chernukho, A. Bogaerts, R. Gijbels, C. Leys, J. Appl. Phys. 97, 123310 (2005)
H.C. Kim, F. Iza, S.S. Yang, M. Radmilovic-Radjenovic, J.K. Lee, J. Phys. D: Appl. Phys. 38, R283 (2005)
A. Bogaerts, R. Gijbels, Plasma Sources Sci. Technol. 11, 27 (2002)
A. Bogaerts, R. Gijbels, W. Goedheer, Jpn J. Appl. Phys. 38, 4404 (1999)
K. Charrada, G. Zissis, M. Aubes, J. Phys. D: Appl. Phys. 29, 2432 (1996)
G. Chen, L.L. Raja, J. Appl. Phys. 96, 6073 (2004)
E. Wagenaars, R. Brandenburg, W.J.M. Brok, M.D. Bowden, H.E. Wagner, J. Phys. D: Appl. Phys. 39, 700 (2006)
P. Bartoš, R. Hrach, P. Jelínek, Vacuum 82, 220 (2008)
M. Mitchner, C.H. Kruger, Partially Ionized Gases (Wiley, New York, 1973)
R.W. Hockney, J.W. Eastwood, Computer Simulation Using Particles (Taylor and Francis, New York, 1988).
V. Hrachová, A.-M. Diamy, O. Kylián, A. Kaňka, J.-C. Legrand, in Advances in Plasma Physics Research, Vol. II (NOVA, Science Publishers Inc., New York, 2003)
J.P. Boeuf, L.C. Pitchford, Phys. Rev. E 51, 1376 (1995)
B. Briehl, H.M. Urbassek, J. Appl. Phys. 93, 4420 (2003)
O. Demokan, Y. Filiz, J. Appl. Phys. 93, 83 (2003)
E.V. Barnat, G.A. Hebner, J. Appl. Phys. 97, 063301 (2005)
Y.T. Pei, S.P. Shaha, C.Q. Chen, R. van der Hulst, A.A. Turkin, J.Th.M. De Hosses, Proc. 14th Intern. Conf. on Thin Films ICTF 14, Ghent, Belgium, 71 (2008)
R. Hrach, D. Sedlák, M. Vicher, J. Šimek, Thin Solid Films 459, 137 (2004)
Z. Pekárek, R. Hrach, Vacuum 82, 244 (2008)
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Hrach, R., Bartoš, P. & Hrachová, V. Computational study of plasma-surface interaction in plasma-assisted technologies. Eur. Phys. J. D 54, 417–423 (2009). https://doi.org/10.1140/epjd/e2009-00122-9
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DOI: https://doi.org/10.1140/epjd/e2009-00122-9