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Spectroscopic ellipsometric evidence of the solid-state reactions in Ni/Si multilayered films, induced by ion-beam mixing and thermal annealing

  • Solid and Condensed State Physics
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Abstract.

Solid-state reactions, induced by ion-beam mixing (IBM) and thermal annealing, in Ni/Si multilayered films (MLF) with an overall stoichiometry of Ni2Si, NiSi and NiSi2, while keeping the nominal thickness of Ni sublayer constant (3.0 nm), were studied by using spectroscopic ellipsometry as well as X-ray diffraction (XRD). The mixing was performed with Ar+ ions of an energy of 80 keV and a dose of 1.5× 1016 Ar+/cm2. Unlike the results of our previous study on Fe/Si MLF [Y.V. Kudryavtsev et al., Phys. Rev. B 65, 104417 (2002)], it was shown that an amorphous phase of NiSi in the B20 phase was formed during deposition independent of the overall stoichiometry of MLF, i.e., the nominal thickness of Si sublayer. IBM leads to some structural changes in the Ni/Si MLF, which cannot be detected by XRD but are confidently recognized by optical tools. A thermal annealing at 673 K of the Ni/Si MLF with an overall stoichiometry of NiSi and NiSi2 causes formation of the η-NiSi phase. The first trace of NiSi2 phase on the background of the η-NiSi phase was detected by XRD after an annealing at 1073 K, while, according to the optical results, NiSi2 turned out to be the dominant phase for the annealed Ni/Si MLF with an overall stoichiometry of NiSi2.

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References

  • T.B. Massalski, Binary Alloy Phase Diagram, 2nd edn. (ASM, Metals Park, OH, 1990), Vol. 3, p. 2859

  • J.O. Olowolafe, M.-A. Nicolet, J.W. Mayer, Thin Solid Films 38, 143 (1976)

    CAS  Google Scholar 

  • S.P. Murarka, Silicides for VLSI Applications (Academic, Orlando, 1983)

  • L.A. Clevenger, C.V. Thompson, R.C. Cammarata, K.N. Tu, Appl. Phys. Lett. 52, 795 (1988)

    Article  CAS  Google Scholar 

  • C.J. Tsai, K.H. Yu, Thin Solid Films 350, 91 (1999)

    Article  CAS  Google Scholar 

  • P. Knauth, A. Charaï, C. Bergman, P. Gas, J. Appl. Phys. 76, 5195 (1994)

    CAS  Google Scholar 

  • B. Bokhonov, M. Korchagin, J. Alloys Comp. 319, 187 (2001)

    Article  CAS  Google Scholar 

  • B.A. Julies, D. Knoesen, R. Pretorius, D. Adams, Thin Solid Films 347, 201 (1999)

    CAS  Google Scholar 

  • D. Mangelinck, P. Gas, A. Grob, B. Pichaud, O. Thomas, J. Appl. Phys. 79, 4078 (1996)

    Article  CAS  Google Scholar 

  • E.E. Fullerton, J.E. Mattson, S.R. Lee, C.H. Sowers, Y.Y. Huang, G. Felcher, S.D. Bader, F.T. Parker, J. Magn. Magn. Mater. 117, L301 (1992); G.J. Strijkers, J.T. Kohlhepp, H.J.M. Swagten, W.J.M. de Jonge, Phys. Rev. B 60, 9583 (1999)

    Google Scholar 

  • M.A. Hollander, B.J. Thijsse, E.J. Mittemeijer, Phys. Rev. B 42, 5481 (1990)

    Google Scholar 

  • A. Chaiken, R.P. Michel, M.A. Wall, Phys. Rev. B 53, 5518 (1995)

    Article  Google Scholar 

  • Y.V. Kudryavtsev, Y.P. Lee, J. Dubowik, B. Szymański, J.Y. Rhee, Phys. Rev. B 65, 104417 (2002)

    Article  Google Scholar 

  • M.F. Wu, J.D. Wachter, A.-M. Van Bavel, R. Moons, A. Vantomme, H. Pattyn, G. Langouche, H. Bender, J. Vanhellemont, K. Temst, Y. Bryunseraede, J. Appl. Phys. 78, 1707 (1995)

    Article  CAS  Google Scholar 

  • O. Fathy, O.W. Holland, J. Narayan, J. Appl. Phys. 58, 297 (1985)

    Article  CAS  Google Scholar 

  • Z. Rao, J.S. Williams, A.P. Pogany, D.K. Sood, G.A. Collins, J. Appl. Phys. 77, 3782 (1995)

    Article  CAS  Google Scholar 

  • R. Pretorius, C.C. Theron, A.C. Vantomme, J.W. Mayer, Critical Reviews in Solid State and Material Sciences 24, 1 (1999)

    CAS  Google Scholar 

  • J. Decoster, H. Bemelmans, S. Degroote, R. Moons, J. Verheyden, A. Vantomme, G. Langouche, J. Appl. Phys. 81, 5349 (1997)

    Article  Google Scholar 

  • B.P. Voznyuk, R. Gontarz, J. Dubowik, Yu.V. Kudryavtsev, N.A. Lesnik, Sov. Phys. Solid State. 32, 409 (1990)

    Google Scholar 

  • M. Amiotti, A. Borghesi, G. Guizetti, F. Nava, Phys. Rev. B 42, 8939 (1990)

    CAS  Google Scholar 

  • A. Humbert, A. Cros, J. Phys. Lett. 44, L929 (1983)

  • H.W. Chen, J.T. Lue, J. Appl. Phys. 59, 2165 (1986)

    Article  CAS  Google Scholar 

  • J.R. Jimenez, Z.C. Wu, L.J. Schowalter, B.D. Hunt, R.W. Fathauer, P.J. Grunthaner, T.L. Lin, J. Appl. Phys. 66, 2738 (1989)

    Article  CAS  Google Scholar 

  • Y.P. Lee, K.W. Kim, Y.V. Kudryavtsev, V.V. Nemoshkalenko, B. Szymański, Eur. Phys. J. B 26, 41 (2002)

    Article  CAS  Google Scholar 

  • R.M.A. Azzam, N.M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1977)

  • J. Kohlhepp, M. Valkier, A. van der Graaf, F.J.A. den Broeder, Phys. Rev. B 55, R 696 (1997)

    Google Scholar 

  • V.S. Babu, A.S. Pavlovic, M.S. Seehra, J. Appl. Phys. 79, 5230 (1996)

    Article  CAS  Google Scholar 

  • G.S. Chang, S.M. Jung, J.H. Song, H.B. Kim, J.J. Woo, D.H. Byun, C.N. Whang, Nucl. Instr. Meth. B 121, 244 (1997)

    CAS  Google Scholar 

  • U. Schmid, J. Humliček, F. Lukeš, M. Cardona, U. Presting, H. Kibbel, E. Kaspar, K. Eberl, W. Wegscheider, G. Abstreiter, Phys. Rev. B 45, 6793 (1992)

    Article  CAS  Google Scholar 

  • H. Ehrenreich, H.P. Philipp, D.J. Olechna, Phys. Rev. 131, 2469 (1963)

    Article  CAS  Google Scholar 

  • M. Shiga, G.P. Pells, J. Phys. C 2, 1847 (1969)

    CAS  Google Scholar 

  • L.A. Clevenger, C.V. Thompson, J. Appl. Phys. 67, 1325 (1990)

    Article  CAS  Google Scholar 

Download references

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Authors and Affiliations

  1. Quantum Photonic Science Research Center and Department of Physics, Hanyang University, Seoul, 133-791, Korea

    Y. P. Lee

  2. Institute of Metal Physics, National Academy of Sciences of Ukraine, 36 Vernadsky str, 03142, Kiev, Ukraine

    Y. V. Kudryavtsev

  3. NTU “Kiev Polytechnical Institute”, 37 Pobedy ave., Kiev, Ukraine

    Y. N. Makogon & E. P. Pavlova

  4. Department of Physics, Hoseo University, Asan, Choongnam, 336-795, Korea

    J. Y. Rhee

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  1. Y. P. Lee
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  2. Y. V. Kudryavtsev
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  3. Y. N. Makogon
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  4. E. P. Pavlova
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  5. J. Y. Rhee
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Correspondence to Y. P. Lee.

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Lee, Y., Kudryavtsev, Y., Makogon, Y. et al. Spectroscopic ellipsometric evidence of the solid-state reactions in Ni/Si multilayered films, induced by ion-beam mixing and thermal annealing. Eur. Phys. J. B 44, 431–438 (2005). https://doi.org/10.1140/epjb/e2005-00142-3

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