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The European Physical Journal Special Topics

, Volume 167, Issue 1, pp 27–32 | Cite as

Effect of surface roughness on multilayer film growth

  • M. H. ModiEmail author
  • S. K. Rai
  • M. Thomasset
  • G. S. Lodha
  • M. Idir
Regular Article

Abstract

NbC/Si multilayers grown on silicon substrates of different roughness have been used to study the influence of surface quality on growth characteristics. Surface morphology of substrate and multilayer film are characterized by topographic measurements using atomic force microscopy (AFM) technique and power spectral density analysis (PSD). Grazing incidence x-ray reflectivity (GIXR) technique in combination with PSD analysis reveals a growth characteristic of multilayer film on substrates of different roughness. It is revealed that the stochastic growth of NbC on rough substrate leads to formation of clusters of varying size depending on initial substrate roughness. Details of growth characteristic are discussed.

Keywords

Atomic Force Microscopy Spatial Frequency Power Spectral Density European Physical Journal Special Topic Niobium Carbide 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© EDP Sciences and Springer 2009

Authors and Affiliations

  • M. H. Modi
    • 1
    • 2
    Email author
  • S. K. Rai
    • 2
  • M. Thomasset
    • 1
  • G. S. Lodha
    • 2
  • M. Idir
    • 1
  1. 1.Synchrotron SOLEIL, L’Orme des MerisiersGif-sur-Yvette CedexFrance
  2. 2.Raja Ramanna Centre for Advanced TechnologyIndoreIndia

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