Structural and dielectric properties of TiO2 thin films grown at different sputtering powers
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TiO2 thin films have been grown by the rf magnetron sputtering technique at different sputtering powers (90, 110, 130 and 150W). The particle size and shape have changed depending on the sputtering power. The XRD results have revealed that the polycrystalline films have a single or mixed phase. The variation in the crystal phase has affected the value of the dielectric constant. The rutile TiO2 thin film has exhibited a higher dielectric constant. The dielectric constant has decreased with increasing frequency.
- 8.P.M. Martin, Handbook of Deposition Technologies for Films and Coatings (William Andrew Publications, Burlington, 2010) p. 427Google Scholar
- 14.L.B. Freund, S. Suresh, Thin Film Materials (Cambridge University Press, Cambridge, 2003) p. 10Google Scholar
- 19.I. Bunget, M. Popescu, Physics of Solid Dielectrics (Elsevier, New York, 1984) pp. 244, 247Google Scholar
- 22.M. Jawaid, M.M. Khan, Polymer-based Nanocomposites for Energy and Environmental Applications (Woodhead Publishing, 2018) p. 158Google Scholar