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On a non-thermal atmospheric pressure plasma jet used for the deposition of silicon-organic films

  • Jan SchäferEmail author
  • Florian Sigeneger
  • Rüdiger Foest
  • Detlef Loffhagen
  • Klaus-Dieter Weltmann
Regular Article
Part of the following topical collections:
  1. Topical Issue: Fundamentals of Complex Plasmas

Abstract

This work represents a concise overview on the results achieved by the authors over the last years on the plasma of a non-thermal reactive plasma jet at atmospheric pressure and of related thin film formation by plasma enhanced chemical vapour deposition (PECVD). The source was developed considering the application of the plasma self-organization for PECVD. The experimental methods comprise spectroscopic measurements of plasma parameters in the active zone, temperature measurements in the active zone and the effluent as well as the analysis of deposited films at the substrate surface. The theoretical investigations are devoted to a single filament in the active zone using a phase-resolved model and to an overall description of the jet including the substrate using a period-averaged model.

Graphical abstract

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Copyright information

© EDP Sciences, SIF, Springer-Verlag GmbH Germany, part of Springer Nature 2018

Authors and Affiliations

  • Jan Schäfer
    • 1
    Email author
  • Florian Sigeneger
    • 1
  • Rüdiger Foest
    • 1
  • Detlef Loffhagen
    • 1
  • Klaus-Dieter Weltmann
    • 1
  1. 1.Leibniz Institute for Plasma Science and Technology e.V.GreifswaldGermany

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