Advertisement

Surface treatment of metals in the plasma of a nanosecond diffuse discharge at atmospheric pressure

  • Mikhail ErofeevEmail author
  • Vasilii Ripenko
  • Mikhail Shulepov
  • Victor Tarasenko
Regular Article
Part of the following topical collections:
  1. Topical Issue: Physics of Ionized Gases (SPIG 2016)

Abstract

The paper presents experimental results on surface treatment of metals in the plasma of a runaway electron preionized diffuse discharge (REP DD) in atmospheric pressure nitrogen. The parameters under study are the elemental composition, the nanohardness, the surface free energy (SFE) and the surface roughness of metals before and after plasma treatment. The study shows that REP DD plasma treatment with 105 discharge pulses provides ultrafine surface cleaning of the treated metals from carbon and increases their surface free energy up to 3 times, whereas the surface nanohardness and roughness of the treated metals remain almost unchanged.

Graphical abstract

References

  1. 1.
    G. Harman, Wire bonding in microelectronics, 3rd edn. (McGrawl-Hill, 2010)Google Scholar
  2. 2.
    H.Y. Peng, M. Devarajan, T.T. Lee, D. Lacey, IEEE T. Compon. Packag. Manuf. Technol. 5, 562 (2015)CrossRefGoogle Scholar
  3. 3.
    P.S. Chauhan, A. Choubey, Zh.W. Zhong, M.G. Petcht, Copper wire bonding (Springer, New York, 2014)Google Scholar
  4. 4.
    S. Kaimori, T. Nonaka, A. Mizoguchi, IEEE T. Adv. Packaging 29, 227 (2006)CrossRefGoogle Scholar
  5. 5.
    Runaway Electrons Preionized Diffuse Discharge, edited by V.F. Tarasenko (Nova Science Publishers, New York, 2015)Google Scholar
  6. 6.
    D.A. Sorokin, M.I. Lomaev, V.F. Tarasenko, in Proceedings of the 12th Int. Conf. on Atomic and Molecular Pulsed Lasers 9810 (Proceedings of SPIE, 2015), 98101M-2Google Scholar
  7. 7.
    V.F. Tarasenko, M.A. Shulepov, M.V. Erofeev, Phys. Atom. Nucl. 78, 1670 (2015)ADSCrossRefGoogle Scholar
  8. 8.
    C. Zhang, M.V. Erofeev, Z. Fang, M.A. Shulepov, Z. Zhou, V.F. Tarasenko, T. Shao, Laser Part. Beams 34, 202 (2016)ADSCrossRefGoogle Scholar
  9. 9.
    M.V. Erofeev, E.Kh. Baksht, A.G. Burachenko, V.F. Tarasenko, Tech. Phys. 60, 1316 (2015)CrossRefGoogle Scholar
  10. 10.
    D.K. Owens, R.C. Wendt, J. Appl. Polym. Sci. 13, 1741 (1969)CrossRefGoogle Scholar
  11. 11.
    W.C. Oliver, G.M. Pharr, J. Mater. Res. 7, 1564 (1992)ADSCrossRefGoogle Scholar
  12. 12.
    M.R. Baklanov, D.G. Shamiryan, Zs. Toekei, G.P. Beyer, T. Conard, S. Vanhaelemeersch, K. Maex, J. Vac. Sci. Technol. B 19 1201 (2001)CrossRefGoogle Scholar

Copyright information

© EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg 2017

Authors and Affiliations

  • Mikhail Erofeev
    • 1
    • 2
    Email author
  • Vasilii Ripenko
    • 1
  • Mikhail Shulepov
    • 1
  • Victor Tarasenko
    • 1
    • 2
  1. 1.Institute of High Current ElectronicsTomskRussia
  2. 2.National Research Tomsk Polytechnic UniversityTomskRussia

Personalised recommendations