Deposition and characterization of organic polymer thin films using a dielectric barrier discharge with different C2Hm/N2 (m = 2, 4, 6) gas mixtures

  • Thejaswini Halethimmanahally Chandrashekaraiah
  • Robert Bogdanowicz
  • Vladimir Danilov
  • Jan Schäfer
  • Jürgen Meichsner
  • Rainer Hippler
Regular Article

Abstract

Organic polymer thin films have been deposited on Si(100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using different C2Hm/N2 (m = 2, 4, 6) gas mixtures. The deposited films were characterized by various spectroscopic techniques. Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS) revealed the chemical functional groups present in the films. The surface chemical compositions have been derived from X-ray photo electron spectroscopy (XPS). FT-IRRAS and XPS show the presence of sp, sp2 and sp3 bonds of carbon and nitrogen. Various functional groups such as NH containing, saturated and unsaturated alkyl groups have been identified. Thin films obtained from C2H2/N2 and C2H4/N2 gas mixtures revealed a higher N/C ratio when compared to thin films obtained from C2H6/N2. Thickness, refractive index and extinction coefficient were evaluated by spectroscopic ellipsometry (SE). Significant differences between the films obtained with different gas mixtures are observed.

Graphical abstract

Keywords

Plasma Physics 

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Copyright information

© EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg 2015

Authors and Affiliations

  • Thejaswini Halethimmanahally Chandrashekaraiah
    • 1
  • Robert Bogdanowicz
    • 1
    • 2
  • Vladimir Danilov
    • 1
  • Jan Schäfer
    • 3
  • Jürgen Meichsner
    • 1
  • Rainer Hippler
    • 1
  1. 1.Institut für PhysikErnst-Moritz-Arndt-Universität GreifswaldGreifswaldGermany
  2. 2.Faculty of Electronics, Telecommunication and InformaticsGdansk University of TechnologyGdanskPoland
  3. 3.Leibniz-Institut für Plasmaforschung und TechnologieGreifswaldGermany

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