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Diagnostics of atmospheric pressure microplasma with a liquid electrode

  • Q. ChenEmail author
  • H. Shirai
Regular Article

Abstract

A rf atmospheric pressure microplasma (APMP) in contact with a liquid electrode is characterized by an optical emission spectroscopy (OES) and a liquid chromatography. The results show that the solution conductivity is the essence for determining the APMP properties rather than the solution pH value. A liquid acidification observed during the APMP treatment is ascribed to the salvation of nitrogen related species created by the APMP. In addition, a typical two-sheath structure of the APMP is revealed by the spatial distribution of OES along the plasma volume. The estimated electron density of the APMP is as high as 1014–1015 cm-3.

Keywords

Plasma Physics 

References

  1. 1.
    A. Gavrukov, I. Shakhova, A. Imanov, O. Petrov, N. Vorona, V. Fortov, Phys. Lett. A 378, 336 (2005)Google Scholar
  2. 2.
    W.C. Davis, R.K. Marcus, J. Anal. At. Spectrom. 16, 931 (2001)CrossRefGoogle Scholar
  3. 3.
    Y. Yin, J. Messier, J. Hopwood, IEEE Trans. Plasma Sci. 27, 1516 (1999)ADSCrossRefGoogle Scholar
  4. 4.
    Q. Chen, T. Kitamura, K. Saito, K. Haruta, Y. Yamano, T. Ishikawa, H. Shirai, Thin Solid Films 516, 4435 (2008)ADSCrossRefGoogle Scholar
  5. 5.
    D. Mariotti, R.M. Sankaran, J. Phys. D 43, 323001 (2010)CrossRefGoogle Scholar
  6. 6.
    P. Bruggeman, E. Ribezl, A. Maslani, J. Degroote, A. Malesevic, R. Rego, J. Vierendeels, C. Leys, Plasma Sources Sci. Technol. 17, 025012 (2008)ADSCrossRefGoogle Scholar
  7. 7.
    P. Bruggemanm, C. Leys, J. Phys. D 42, 053001 (2009) and references thereinADSCrossRefGoogle Scholar
  8. 8.
    T. Cserfalvi, P. Mezei, Fresenius J. Anal. Chem. 355, 813 (1996)Google Scholar
  9. 9.
    C.O. Laux, T.G. Spence, C.H. Kruger, R.N. Zare, Plasma Sources Sci. Technol. 12, 125 (2003)ADSCrossRefGoogle Scholar
  10. 10.
    J.M. Mermet, in Inductively Coupled Plasma Emission Spectroscopy, edited by P. Boumans (Wiley-Interscience, Amsterdam, 1987), Chap. XGoogle Scholar
  11. 11.
    M. Christova, E. Castanos-Martinez, M.D. Calzada, Y. Kabouzi, J.M. Luque, M. Moisan, Appl. Spectrosc. 58, 1032 (2004)ADSCrossRefGoogle Scholar
  12. 12.
    C.O. Laux, T.G. Spence, C.H. Kruger, R.N. Zare, Plasma Sources Sci. Technol. 12, 125 (2003)ADSCrossRefGoogle Scholar
  13. 13.
    H.R. Griem, in Spectral Line Broadening by Plasmas (Academic Press, New York, 1974), p. 316Google Scholar
  14. 14.
    Q. Chen, J. Li, K. Saito, H. Shirai, J. Phys. D 41, 175212 (2008)ADSCrossRefGoogle Scholar
  15. 15.
  16. 16.
    Y. Yin, M.M.M. Bilek, D.R. McKenzie, Surf. Coat. Technol. 200, 3670 (2006)CrossRefGoogle Scholar

Copyright information

© EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg 2012

Authors and Affiliations

  1. 1.Graduate School of Science and Engineering, Saitama UniversitySaitamaJapan

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