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The European Physical Journal D

, Volume 54, Issue 2, pp 165–172 | Cite as

AFM and contact angle investigation of growth and structure of pp-HMDSO thin films

  • E. GrimoldiEmail author
  • S. Zanini
  • R. A. Siliprandi
  • C. Riccardi
Topical issue: 23rd Symposium on Plasma Physics and Technology

Abstract

HMDSO was plasma polymerized on silicon wafer and polyethylene (PE) substrates. The chemical structure of the pp-HMDSO was analyzed with Fourier-transform infrared (FT-IR) spectroscopy. The morphological structure of the thin films deposited on the different substrates was investigated by means of atomic force microscopy (AFM), indicating different coverage mechanisms. In order to investigate the growth process of the pp-HMDSO, films of different thickness were also deposited, varying the plasma deposition time from 10 s to 1800 s. Thickness and structure of such deposits was detected with AFM. Finally, hydrophobic characteristics of the different samples were evaluated by means of contact angle measurements and correlated with the morphological characteristics.

PACS

52.80.Pi High-frequency and RF discharges 52.77.Dq Plasma-based ion implantation and deposition 81.15.Gh Chemical vapor deposition 

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Copyright information

© EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg 2009

Authors and Affiliations

  • E. Grimoldi
    • 1
    Email author
  • S. Zanini
    • 1
  • R. A. Siliprandi
    • 1
  • C. Riccardi
    • 1
  1. 1.Dipartimento di Fisica “G. Occhialini”Universitá degli Studi di Milano-BicoccaMilanoItaly

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