The European Physical Journal D

, Volume 54, Issue 2, pp 173–177 | Cite as

Limited volume thin film deposition on geometrically complicated substrates

  • P. BartošEmail author
  • L. Volfová
  • P. Špatenka
Topical issue: 23rd Symposium on Plasma Physics and Technology


This paper is focused on both the theoretical and experimental study of active particle penetration into a closed slot. Presented in this paper are layer profiles obtained through the plasma polymerization of acetylene on a specially developed substrate and the TiOx based layer profiles obtained by plasma enhanced chemical vapour deposition (PECVD) on a glass substrate. In the second part of the paper a computational fluid model is presented that was developed in order to gain insight into the overriding physical phenomena taking part during the deposition process. This model enables us to predict the layer profile on complicated three-dimensional substrates and to set up the optimal parameters during the layer deposition. The data obtained theoretically and experimentally are compared.


52.65.Kj Magnetohydrodynamic and fluid equation 52.80.Hc Glow; corona 52.40.Hf Plasma-material interactions; boundary layer effects 


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Copyright information

© EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg 2009

Authors and Affiliations

  1. 1.Department of PhysicsUniversity of South BohemiaČeské BudějoviceCzech Republic
  2. 2.Technical University of LiberecLiberecCzech Republic

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