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The European Physical Journal D

, Volume 54, Issue 2, pp 467–472 | Cite as

Al2O3 plasma production during pulsed laser deposition

  • F. CaridiEmail author
  • L. Torrisi
  • A. M. Mezzasalma
  • G. Mondio
  • A. Borrielli
Topical issue: 23rd Symposium on Plasma Physics and Technology

Abstract

A Nd:YAG laser operating in second harmonic (532 nm), 3 ns pulse duration, 150 mJ pulse energy, and 10 Hz repetition rate, is employed to irradiate Al2O3 target placed in high vacuum. The produced plasma is investigated by an ion collector used in time-of-flight configuration and by a mass quadrupole spectrometer, in order to determine the equivalent plasma temperature and the atomic and molecular composition. Pulsed laser deposition technique has been used to produce thin films on different substrates placed close to the target. Different surface analyses, such as energy dispersive X-ray fluorescence (EDXRF), X-ray photoelectron spectroscopy (XPS) and surface profilometry are employed to characterize the produced films. Measurements of ablation yield, plasma equivalent temperature, acceleration voltage and characterization of grown thin films are presented and discussed.

PACS

52.38.Mf Laser ablation 68.55.-a Thin film structure and morphology 

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References

  1. M.C. Kelly, G.G. Gomlak, V.G. Panayotov, C. Cresson, J. Rodney, B.D. Koplitz, Appl. Surf. Sci. 127–129, 988 (1998) Google Scholar
  2. S. Gammino, L. Torrisi, G. Ciavola, L. Andò, L. Celona, S. Manciagli, J. Krasa, L. Laska, M. Pfeifer, K. Rohlena, A.M. Mezzasalma, C. Gentile, A. Picciotto, J. Appl. Phys. 96, 2961 (2004) Google Scholar
  3. L.C. Chen, Pulsed laser deposition of thin films, edited by D.B. Chrisey, G.K. Hubler (J. Wiley & Sons, Inc., New York, 1994), Chap. 6 Google Scholar
  4. Y. Ying, C.P. Mehnert, M.S. Wong, Synthesis and Applications of Supramolecular-Templated Mesoporous Materials (Angewandte Chemie International Edition, 1999) Google Scholar
  5. G.E. Thompson, Thin Solid Films 297, 192 (1997) Google Scholar
  6. A. Manasilp, E. Guari, Appl. Catal. B 37, 17 (2002) Google Scholar
  7. L. Torrisi, A. Ilacqua, F. Caridi, N. Campo, A. Picciotto, R. Barnà, D. De Pasquale, M. Trimarchi, A. Trifirò, L. Auditore, Radiat. Eff. Defects Solids 161, 3 (2006) Google Scholar
  8. L. Torrisi, S. Gammino, L. Andò, L. Laska, J. Appl. Phys. 91, 4685 (2002) Google Scholar
  9. J. Krasa, K. Jungwirth, E. Krousky, L. Laska, K. Rohlena, J. Ullschmied, A. Velyhan, Radiat. Eff. Defects Solids 163 (2008) Google Scholar
  10. http://www.cranessoftware.com/products/systat/ (2006) Google Scholar
  11. F. Barreca, A.M. Mezzasalma, G. Mondio, F. Neri, Phys. Rev. B 62, 16893 (2000) Google Scholar
  12. L. Torrisi, A. Borrielli, D. Margarone, Nucl. Instrum. Meth. B 255, 373 (2007) Google Scholar
  13. L. Torrisi, F. Caridi, D. Margarone, A. Picciotto, A. Mangione, J.J. Beltrano, Appl. Surf. Sci. 252, 6383 (2006) Google Scholar
  14. L. Torrisi, F. Caridi, A. Picciotto, D. Margarone, A. Borrielli, J. Appl. Phys. 100, 093306 (2006) Google Scholar
  15. G.D. Shirkov, G. Zschornack, Electron impact ion sources for charged heavy ions (Verlag Vieweg, Wiesbaden, 1976) Google Scholar
  16. A.M. Mezzasalma, G. Mondio, T. Serafino, F. Caridi, L. Torrisi, Appl. Surf. Sci. 255, 4123 (2009) Google Scholar

Copyright information

© EDP Sciences, SIF, Springer-Verlag Berlin Heidelberg 2009

Authors and Affiliations

  • F. Caridi
    • 1
    • 2
    Email author
  • L. Torrisi
    • 1
    • 2
  • A. M. Mezzasalma
    • 3
    • 2
  • G. Mondio
    • 3
    • 2
  • A. Borrielli
    • 1
    • 2
  1. 1.Dipartimento di FisicaUniversità di MessinaMessinaItaly
  2. 2.INFN-LNS e INFN-Sezione di CataniaCataniaItaly
  3. 3.Dipartimento di Fisica della Materia e Ingegneria elettronicaMessinaItaly

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