Electrical measurements of nanoscale bismuth cluster films

  • M. Schulze
  • S. Gourley
  • S. A. Brown
  • A. Dunbar
  • J. Partridge
  • R. J. Blaikie

DOI: 10.1140/epjd/e2003-00144-3

Cite this article as:
Schulze, M., Gourley, S., Brown, S.A. et al. Eur. Phys. J. D (2003) 24: 291. doi:10.1140/epjd/e2003-00144-3

Abstract.

A range of percolating atomic cluster films, with nanoscale overall dimensions, have been studied using a combination of in situ and ex situ electrical transport measurements, together with field emission electron microscopy and atomic force microscopy. Bismuth clusters with mean diameter 20 nm were deposited between electrical contacts defined by electron beam lithography. The morphology of the films can be understood within percolation theory, and the electrical measurements show complex behaviour characteristic of both percolation effects and modification of the cluster films by current flow and by oxidation.

PACS.

73.63.-b Electronic transport in nanoscale materials and structures 36.40.-c Atomic and molecular clusters 64.60.Ak Renormalization-group, fractal, and percolation studies of phase transitions 81.07.-b Nanoscale materials and structures: fabrication and characterization 

Copyright information

© EDP Sciences, Springer-Verlag, Società Italiana di Fisica 2003

Authors and Affiliations

  • M. Schulze
    • 1
    • 2
  • S. Gourley
    • 1
    • 2
  • S. A. Brown
    • 1
    • 2
  • A. Dunbar
    • 1
    • 2
  • J. Partridge
    • 1
    • 2
  • R. J. Blaikie
    • 1
    • 3
  1. 1.Nanostructure Engineering Science and Technology (NEST) Group and The MacDiarmid Institute for Advanced Materials and NanotechnologyUniversity of CanterburyChristchurchNew Zealand
  2. 2.Department of Physics & AstronomyUniversity of CanterburyChristchurchNew Zealand
  3. 3.Department of Electrical & Computer EngineeringUniversity of CanterburyChristchurchNew Zealand

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