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Physical and chemical processes in gas-discharge plasma during the deposition of nanocarbon films

  • Physicochemical Processes at the Interfaces
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Abstract

The relationship of the parameters of activated methane-hydrogen mixture with the phase composition and structural features was determined for carbon films, which were precipitated from this mixture. Optical emission spectra of dc discharge were studied in conditions of the growth of different nanocarbon films. The peculiarities of the space intensity distribution of radiation corresponding to carbon C2 dimers are shown.

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Authors and Affiliations

  1. Department of Physics, Moscow State University, Moscow, 119991, Russia

    R. R. Ismagilov, A. P. Volkov, P. V. Shvets & A. N. Obraztsov

Authors
  1. R. R. Ismagilov
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  2. A. P. Volkov
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  3. P. V. Shvets
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  4. A. N. Obraztsov
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Corresponding author

Correspondence to R. R. Ismagilov.

Additional information

Original Russian Text © R.R. Ismagilov, A.P. Volkov, P.V. Shvets, A.N. Obraztsov, 2009, published in Fizikokhimiya Poverkhnosti i Zashchita Materialov, 2009, Vol. 45, No. 6, pp. 570–573.

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Ismagilov, R.R., Volkov, A.P., Shvets, P.V. et al. Physical and chemical processes in gas-discharge plasma during the deposition of nanocarbon films. Prot Met Phys Chem Surf 45, 652–655 (2009). https://doi.org/10.1134/S2070205109060021

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  • DOI: https://doi.org/10.1134/S2070205109060021

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