Abstract
A method for preparing metal-containing silicon-carbon composite films with the regular distribution of the nanocrystalline phase over the film thickness (nanostructured films) has been proposed and implemented. The main characteristics of TaC nanocrystal distribution in the prepared samples have been determined.
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Original Russian Text © A.I. Popov, M.Yu. Presnyakov, M.L. Shupegin, A.L. Vasil’ev, 2014, published in Rossiiskie Nanotekhnologii, 2014, Vol. 9, Nos. 7–8.
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Popov, A.I., Presnyakov, M.Y., Shupegin, M.L. et al. Nanostructuring of metal-containing silicon-carbon composite films. Nanotechnol Russia 9, 448–452 (2014). https://doi.org/10.1134/S1995078014040156
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DOI: https://doi.org/10.1134/S1995078014040156