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Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy

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Abstract

The element composition and chemical bonds of nanocomposite films of hydrogenated silicon oxycarbonitride fabricated through high-frequency plasma-chemical deposition from initial gas mixtures of 1,1,3,3-tetramethyldisilazane with nitrogen and oxygen in the temperature range 373–973 K depending on the synthesis conditions is studied. The effect of changes in the temperature and chemical composition of the initial gas mixtures on the element composition and types of chemical bonds in SiC x N y O z :H films is investigated.

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Authors and Affiliations

  1. Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090, Russia

    N. I. Fainer, A. G. Plekhanov & I. P. Asanov

  2. Novosibirsk National Research State University (Novosibirsk State University), Novosibirsk, 630090, Russia

    I. P. Asanov

Authors
  1. N. I. Fainer
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  2. A. G. Plekhanov
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  3. I. P. Asanov
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Correspondence to N. I. Fainer.

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Original Russian Text © N.I. Fainer, A.G. Plekhanov, I.P. Asanov, 2017, published in Fizika i Khimiya Stekla.

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Fainer, N.I., Plekhanov, A.G. & Asanov, I.P. Study of chemical bonds and element composition of silicon oxycarbonitride films by the methods of XP-, IR-, and energy-dispersive spectroscopy. Glass Phys Chem 43, 410–416 (2017). https://doi.org/10.1134/S1087659617050042

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  • DOI: https://doi.org/10.1134/S1087659617050042

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