Erratum to: Atomic Layer Deposition of Ni–Mn–O Coatings Using Precursors Equivalent

The title should be replaced by the following: Atomic Layer Deposition of Ni–Mn–O Coatings Using Precursors Equivalent.

The family name of the last author in the title page and in AUTHOR CONTRIBUTION should be read as: Maximov.

ABSTRACT should be replaced by the following: Ni–Mn–O thin films were obtained by atomic layer deposition (ALD) using equivalent pulses of Ni and Mn precursors. Bis(cyclopentadienyl)nickel (NiCp₂) and tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III) [Mn(thd)₃] were used as organometallic reactants. Oxygen plasma was used as the oxidizing agent. Growth per ALD cycle (GPC) of Ni–Mn–O coatings exceeds the calculated value of the average GPC of monoxides. At equivalent pulses, the nickel content in the coatings exceeds the manganese content. Electrochemical cycling of Ni–Mn–O electrodes shows a high capacity and Coulomb efficiency, about 100%. With an 80-fold increase in the discharging current, the discharging capacity decreases by less than 30%.

In the keywords, and body of the article “molecular layering” should be replaced by “atomic layer deposition.”

In page 353 DAlKhIm and DAlKhIm should be read as DALCHEM.

FUNDING section should be replaced by the following: The research was supported by the Ministry of Science and Higher Education of the Russian Federation (State Assignment for basic research 0784–2020-0022).

ACKNOWLEDGMENTS section should be replaced by the following: This research was conducted using the equipment of the resource centers of the Research Park of the St. Petersburg State University, “Innovative Technologies of Composite Nanomaterials,” “Physical Methods of Surface Investigation.”