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Synthesis of Photosensitive Cyclopropane-Containing Polymers

  • Macromolecular Compounds and Polymeric Materials
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Abstract

New cyclopropyl methacrylate monomers were prepared, their radical polymerization was performed, and the composition and structure of the polymers obtained, containing reactive UV-sensitive fragments, were determined. Experiments on photochemical cross-linking revealed photosensitivity of the polymers synthesized. The materials based on them are optically transparent and can be used in microelectronics and optics.

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Authors and Affiliations

  1. Institute of Polymer Materials, National Academy of Sciences of Azerbaijan, Sumgayit, Az5004, Azerbaijan

    K. G. Guliyev, A. E. Rzayeva & A. M. Guliyev

Authors
  1. K. G. Guliyev
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  2. A. E. Rzayeva
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  3. A. M. Guliyev
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Correspondence to K. G. Guliyev.

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Conflict of Interest

The authors declare that they have no conflict of interest.

Russian Text © The Author(s), 2019, published in Zhurnal Prikladnoi Khimii, 2019, Vol. 92, No. 9, pp. 1131–1139.

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Guliyev, K.G., Rzayeva, A.E. & Guliyev, A.M. Synthesis of Photosensitive Cyclopropane-Containing Polymers. Russ J Appl Chem 92, 1215–1222 (2019). https://doi.org/10.1134/S1070427219090052

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  • DOI: https://doi.org/10.1134/S1070427219090052

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