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Specific features of chemical deposition of polytetrafluoroethylene films from hexafluoropropylene oxide

  • From Materials of All-Russian Conference “Chemistry of Surface and Nanotechnology”
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Abstract

Influence of the main process parameters on the hot wire chemical vapor deposition (HW-CVD) of polytetraethylene (PTFE) films in the hexafluoropropylene (HFPO)-argon system at low pressure as well as the gas flow structure in the reactor and its effect on the precursor conversion was evaluated. It was found out that that the conversion reaches ∼90% at the hot wire temperature above 800°C, increases ∼5.5 times with the increase in pressure from 7.5 to 35 Pa and decreases twice with the increase of precursor flow from 8 to 33 ml min−1. It was shown that the process parameters affect significantly the gas residence time and average temperature, and also the intensity of gas flow recirculation in the reactor.

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Authors and Affiliations

  1. St. Petersburg State Polytechnical University, ul. Politekhnicheskaya 29, St. Petersburg, 195251, Russia

    A. A. Uvarov & S. E. Aleksandrov

Authors
  1. A. A. Uvarov
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  2. S. E. Aleksandrov
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Correspondence to A. A. Uvarov.

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Original Russian Text © A.A. Uvarov, S.E. Aleksandrov, 2013, published in Zhurnal Obshchei Khimii, 2013, Vol. 83, No. 8, pp. 1378–1383.

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Uvarov, A.A., Aleksandrov, S.E. Specific features of chemical deposition of polytetrafluoroethylene films from hexafluoropropylene oxide. Russ J Gen Chem 83, 1607–1612 (2013). https://doi.org/10.1134/S1070363213080239

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  • DOI: https://doi.org/10.1134/S1070363213080239

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