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Vacuum evaporation-deposited polyterafluoroethylene films: Growth mechanism, properties, and applications

  • Supplement: Rossiiskii Khimicheskii Zhurnal-Zhurnal Rossiiskogo Khimicheskogo Obshchestva im. D.I. Mendeleeva (Russian Chemistry Journal)
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Abstract

The method of vacuum evaporation deposition of polyterafluoroethylene films under additional vapor activation with an electron cloud and low temperature plasma was described. The film composition, structure, and properties can be controlled by deposition conditions. Co-evaporation with metals and dyes allowed deposition of various composite films. Gold-filled films were modified with thiol for gas sensor applications.

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  1. Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, prosp. Nauki 45, Kiev, 03650, Ukraine

    K. P. Gritsenko

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Original Russian Text © K.P. Gritsenko, 2009, published in Rossiiskii Khimicheskii Zhurnal, 2009, Vol. 52, No. 3, pp. 112–122.

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Gritsenko, K.P. Vacuum evaporation-deposited polyterafluoroethylene films: Growth mechanism, properties, and applications. Russ J Gen Chem 79, 642–656 (2009). https://doi.org/10.1134/S1070363209030463

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