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Flux of High-Energy Positive Oxygen Ions from Plasma to a Substrate in a Pulsed Magnetron Discharge with a Hot Target

  • PHYSICAL PROCESSES IN ELECTRON DEVICES
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Abstract

A group of high-energy positive O+ ions in a plasma flow from a high-current pulsed magnetron discharge with a hot target in an Ar/O2 gas mixture. The mechanism of occurrence of accelerated O+ ions is the conversion of negative ions accelerated in the cathode layer O → O+ in the processes of charge exchange or ionization by electron impact.

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REFERENCES

  1. Handbook of Thin Film Deposition, Eds K. Seshan, D. Schepis, 4th ed. (Elsevier, Amsterdam, 2018).

    Google Scholar 

  2. D. M. Mattox, Handbook of Physical Vapor Deposition (PVD) Processing (Elsevier, Amsterdam, 2010).

    Google Scholar 

  3. S. K. Aghda, D. M. Holzapfel, D. Music, et al., Acta Mater. 250, 118864 (2023).

    Article  Google Scholar 

  4. G. Greczynski, I. Petrov, J. E. Greene, et al., J. Vac. Sci. Technol. Am. Vacuum Soc. 37, 060801 (2019).

    Article  Google Scholar 

  5. K. Ellmer and T. Welzel, J. Mater. Res. 27, 765 (2012).

    Article  Google Scholar 

  6. T. Welzel and K. Ellmer, Vak. Forsch. Prax. 25 (2), 52 (2013).

    Article  Google Scholar 

  7. A. V. Kaziev, D. V. Kolodko, A. V. Tumarkin, et al., Surf. Coatings Technol. 409, 126889 (2021).

    Article  Google Scholar 

  8. A. V. Tumarkin, A. V. Kaziev, M. M. Kharkov, et al., Surf. Coatings Technol. 293, 42 (2016).

    Article  Google Scholar 

  9. D. V. Kolodko, D. G. Ageychenkov, A. V. Kaziev, et al., J. Instrum. 14, 10005 (2019).

    Article  Google Scholar 

  10. D. V. Kolodko, A. V. Kaziev, A. V. Tumarkin, in Proc. 8th Int. Congress on Energy Fluxes and Radiation Effects. Crossref, 2022, p. 1028.

  11. R. Hippler, M. Cada, V. Stranak, et al., J. Phys. Commun. IOP Publishing 3, 055011 (2019).

    Article  Google Scholar 

  12. R. Hippler, M. Cada, V. Stranak, et al., J. Appl. Phys. 125, 013301 (2019).

    Article  Google Scholar 

  13. P. Pokornу́, J. Bulíř, J. Lančok, et al., Plasma Process. Polym. 7, 910 (2010).

    Article  Google Scholar 

  14. P. Pokornу́, J. Musil, J. Lančok, et al., Vacuum 143, 438 (2017).

    Article  Google Scholar 

  15. R. Hippler and C. Denker, Plasma Sources Sci. Technol. 28, 035008 (2019).

    Article  Google Scholar 

  16. P. Pokornу́, M. Misina, J. Bulíř, et al., Plasma Process. Polym. 8, 459 (2011).

    Article  Google Scholar 

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Funding

This study was supported by the Russian Science Foundation, project no. 18-79-10242.

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Correspondence to D. V. Kolodko.

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The work was awarded a prize at the 19th Ivan Anisimkin Young Scientists Competition.

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Kolodko, D.V., Kaziev, A.V., Ageichenkov, D.G. et al. Flux of High-Energy Positive Oxygen Ions from Plasma to a Substrate in a Pulsed Magnetron Discharge with a Hot Target. J. Commun. Technol. Electron. 68, 1249–1251 (2023). https://doi.org/10.1134/S1064226923100078

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  • DOI: https://doi.org/10.1134/S1064226923100078

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