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Analysis of the Parameters of Atomic and Molecular Beams in Molecular Beam Epitaxy Installations

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Abstract

An implementation of a structurally simple and rather universal method for determining the intensities of atomic and molecular beams based on recording the magnitude of small-angle electron scattering that occurs during the interaction of a narrow electron beam with atoms of the evaporated substance is presented.

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Authors and Affiliations

  1. JSC NPO Orion, 111538, Moscow, Russia

    N. A. Kulchitsky

  2. MIREA — Russian Technological University, 119454, Moscow, Russia

    N. A. Kulchitsky

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  1. N. A. Kulchitsky
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Correspondence to N. A. Kulchitsky.

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Kulchitsky, N.A. Analysis of the Parameters of Atomic and Molecular Beams in Molecular Beam Epitaxy Installations. J. Commun. Technol. Electron. 66 (Suppl 1), S56–S61 (2021). https://doi.org/10.1134/S1064226921130039

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  • DOI: https://doi.org/10.1134/S1064226921130039

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