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Features of Indium Tin Oxide Film Deposition by Magnetron Sputtering

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Abstract—Polycrystalline transparent conductive indium tin oxide layers are grown by direct current magnetron reactive sputtering of the substrate at room temperature. Studies of the obtained films showed that growth of the lowest-resistance transparent films with a polycrystalline structure occurs in the region with increased negative bombardment by oxygen ions.

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Funding

The study was carried out as part of a state task and was partially supported by the Russian Foundation for Basic Research (project nos. 19-07-00432, 18-29-19047, 18-07-00729).

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Authors and Affiliations

  1. Fryazino Branch, Kotelnikov Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 141190, Fryazino, Moscow oblast, Russia

    V. A. Luzanov

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  1. V. A. Luzanov
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Correspondence to V. A. Luzanov.

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Luzanov, V.A. Features of Indium Tin Oxide Film Deposition by Magnetron Sputtering. J. Commun. Technol. Electron. 65, 290–291 (2020). https://doi.org/10.1134/S1064226920030110

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  • DOI: https://doi.org/10.1134/S1064226920030110

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