Abstract
For polycrystalline films of cobalt that have the thickness t ≈ 1.3–133 nm and that are deposited via DC magnetron sputtering on SiO2(0.1 μm)/Si(100) substrates, surface-roughness root-mean-square amplitude σ and surface correlation length ξ, which characterize the roughness of film surfaces, as well as saturation magnetization 4πM 0, width of ferromagnetic-resonance line ΔH, coercitivity H C, and saturation fields H S, are studied as functions of film thickness t. It is shown that the behavior of dependences H C(t) and H S(t) coincides with the behavior of dependence σ(t)/t, whereas the behavior of 4πM 0(t) depends on ratio t/σ(t). The dependence of the FMR line width on the film thickness, ΔH(t), is characterized by a minimum of ΔH ≈ 60 Oe present in the region of thicknesses of 30 to 60 nm. The behavior of dependence ΔH(t) is determined by ratio σ(t)/t at small thicknesses t ≤ 5 nm and by the behavior of σ(t) at t ≥ 5 nm.
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Original Russian Text © A.S. Dzhumaliev, Yu.V. Nikulin, Yu.A. Filimonov, 2009, published in Radiotekhnika i Elektronika, 2009, Vol. 54, No. 3, pp. 347–351.
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Dzhumaliev, A.S., Nikulin, Y.V. & Filimonov, Y.A. Surface roughness and magnetic properties of Co/SiO2/Si(100) polycrystalline films deposited via DC magnetron sputtering. J. Commun. Technol. Electron. 54, 331–335 (2009). https://doi.org/10.1134/S1064226909030115
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DOI: https://doi.org/10.1134/S1064226909030115