Abstract
The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at selective reactive ion mask etching of large substrates in Freon-14 has been investigated both theoretically and experimentally. It is shown for masks with a coating of substrates of more than 30% that the reactive power component increases at distances from the center that are close to the substrate radius. It is established that the specific reactive power is independent of the thickness and type of metal masks. It is shown experimentally that masks with any substrate-coating coefficient of practical importance connected to the lower electrode via a substrate holder improve matching by decreasing the power reflectance.
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Funding
This study was performed within the framework of a state assignment for the Federal Scientific Research Center “Crystallography and Photonics” of the Russian Academy of Sciences (agreement no. 007-GZ/43363/26) and agreement on research no. 08/2017 (the ordering customer being the State Institute of Applied Optics).
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Translated by A. Sin’kov
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Poletayev, S.D., Lyubimov, A.I. The Influence of Metal Masks on Matching of the Lower Electrode and a High-Frequency Bias Generator at Reactive Ion Etching of Large Substrates. Tech. Phys. Lett. 47, 569–572 (2021). https://doi.org/10.1134/S1063785021060122
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DOI: https://doi.org/10.1134/S1063785021060122