Abstract—Studies have been carried out and a technology has been developed for the formation of a separating mesa structure in fabrication of multi-junction solar cells based on the GaInP/GaInAs/Ge heterostructure. Methods for etching of the heterostructure layers have been studied: wet chemical etching in compositions based on HBr, K2Cr2O7, and H2O and the plasmachemical etching in a flow of the BCl3 working gas. A comparative analysis of the etching methods was made. Protective masks based on a photoresist layer and TiOx/SiO2 were developed. Multi-junction solar cells with low leakage current (less than 10–7 A at a voltage of 0.5–1 V) were fabricated.
This is a preview of subscription content, access via your institution.
Buy single article
Instant access to the full article PDF.
Tax calculation will be finalised during checkout.
M. A. Green, E. D. Dunlop, D. H. Levi, J. Hohl-Ebinger, M. Yoshita, and A. W. Y. Ho-Baillie, Progr. Photovolt.: Res. Appl. 27, 565 (2019). https://doi.org/10.1002/pip.3171
Zh. I. Alferov, V. M. Andreev, and V. D. Rumyantsev, in Concentrator Photovoltaics, Ed. by A. Luque and V. Andreev, Vol. 130 of Springer Series in Optical Sciences (Springer, Berlin, Heidelberg, 2007), p. 25. https://doi.org/10.1007/978-3-540-68798-6_2
M. E. Levinshtein, Semiconductor Technology (Wiley-Interscience, USA, 1997).
A. V. Malevskaya, N. D. Il’inskaya, and V. M. Andreev, Tech. Phys. Lett. 45, 1230 (2019). https://doi.org/10.1134/S1063785019120241
E. V. Kontrosh, A. V. Malevskaya, N. M. Lebedeva, E. A. Grebenshchikova, L. V. Kontrosh, N. D. Il’inskaya, and V. S. Kalinovskii, Al’tern. Energet. Ekol. 19 (183), 70 (2015). https://doi.org/10.15518/isjaee.2015.19.009
D. I. Solovetskii, in Low Temperature Plasma Encyclopedia (Nauka, Moscow, 2000), Vol. 3 [in Russian].
M. de Lafontaine, E. Pargon, C. Petit-Etienne, G. Gay, A. Jaouad, M.-J. Gour, M. Volatier, S. Fafard, V. Aimez, and M. Darnon, Sol. Energy Mater. Sol. Cells 195, 49 (2019). https://doi.org/10.1016/j.solmat.2019.01.048
F. F. Chen and J. P. Chang, Lecture Notes on Principles of Plasma Processing (Kluwer/Plenum, New York, 2002).
T. V. Svistova, Beam and Plasma Technologies (VGTU, Voronezh, 2016) [in Russian].
The authors declare that they have no conflict of interest.
Translated by M. Tagirdzhanov
About this article
Cite this article
Malevskaya, A.V., Zadiranov, Y.M., Malevskii, D.A. et al. Plasmachemical and Wet Etching in the Postgrowth Technology of Solar Cells Based on the GaInP/GaInAs/Ge Heterostructure. Tech. Phys. Lett. 47, 114–117 (2021). https://doi.org/10.1134/S1063785021020103
- multi-junction solar cells
- mesa structure.