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Processing of finely dispersed zirconium silicate powder in a high-frequency induction plasmatron jet

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Abstract

The physical peculiarities and prospects of using high-frequency plasma discharge for processing of finely dispersed zirconium silicate powder are considered. A high-frequency induction plasmatron setup is described.

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References

  1. Low-Temperature Plasma, Vol. 6: High-Frequency and Microwave Plasmatrons, Ed. by S. V. Dresvin et al. (Nauka, Novosibirsk, 1992) [in Russian].

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  2. N. N. Rykalin and L. M. Sorokin, Metallurgical Plasmatrons: Electro- and Gasdynamics (Nauka, Moscow, 1987) [in Russian].

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  3. Yu. V. Tsvetkov and S. A. Panfilov, Low-Temperature Plasma in Reduction Processes (Nauka, Moscow, 1980) [in Russian].

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Authors and Affiliations

  1. SIGNAL Device Plant, Tekhnokeramika Co., Verkhov’e, Kaluga oblast, 249035, Russia

    I. N. Novikov & A. M. Kruchinin

Authors
  1. I. N. Novikov
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  2. A. M. Kruchinin
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Correspondence to I. N. Novikov.

Additional information

Original Russian Text © I.N. Novikov, A.M. Kruchinin, 2014, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2014, Vol. 40, No. 20, pp. 76–81.

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Novikov, I.N., Kruchinin, A.M. Processing of finely dispersed zirconium silicate powder in a high-frequency induction plasmatron jet. Tech. Phys. Lett. 40, 920–922 (2014). https://doi.org/10.1134/S1063785014100253

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  • DOI: https://doi.org/10.1134/S1063785014100253

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