Abstract
Silica glass was subjected to a low-energy implantation with 40-keV Cu+ ions at a dose of 7.5 × 1016 ions/cm2 and an ion-beam current density of 5 μA/cm2 through a surface metal-wire mask with square holes of ∼40 μm. The formation of copper nanoparticles in the glass was determined from the occurrence of characteristic plasmon optical absorption and through the detection of particles using an atomic force micro- scope. The formation of periodic surface microstructures via the local etching of silica glass during implantation was observed using a scanning electron microscope. The operating efficiency of the diffractive optical plasmonic element based on silica glass microstructures with metallic copper nanoparticles was shown during its sounding by the emission of a helium-neon laser.
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Original Russian Text © T.S. Kavetskyy, M.F. Galyautdinov, V.F. Valeev, V.I. Nuzhdin, Yu.N. Osin, A.B. Evlyukhin, A.L. Stepanov, 2013, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2013, Vol. 39, No. 13, pp. 17–23.
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Kavetskyy, T.S., Galyautdinov, M.F., Valeev, V.F. et al. The formation of periodic diffractive plasmonic nanostructures with implanted copper nanoparticles by local ion etching of silica glass. Tech. Phys. Lett. 39, 591–593 (2013). https://doi.org/10.1134/S1063785013070067
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DOI: https://doi.org/10.1134/S1063785013070067