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Thin magnetite films on an oxidized silicon surface: Raman spectroscopy study

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Abstract

Polycrystalline films of magnetite (Fe3O4) formed by the reactive sputtering of iron in oxygen on Si(001) substrates covered by thin (1.4 nm) or thick (1200 nm) SiO2 layers have been studied by Raman spectroscopy. It is established that (i) the α-Fe2O3 phase is formed due to the laser-induced heating in magnetite films synthesized on thick SiO2 layers and (ii) the formation of α-Fe2O3 phase depends on the thickness of the buffer SiO2 layer.

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Correspondence to V. A. Vikulov.

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Original Russian Text © V.A. Vikulov, V.V. Balashev, T.A. Pisarenko, A.A. Dimitriev, V.V. Korobtsov, 2012, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2012, Vol. 38, No. 16, pp. 87–94.

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Vikulov, V.A., Balashev, V.V., Pisarenko, T.A. et al. Thin magnetite films on an oxidized silicon surface: Raman spectroscopy study. Tech. Phys. Lett. 38, 772–775 (2012). https://doi.org/10.1134/S106378501208024X

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  • DOI: https://doi.org/10.1134/S106378501208024X

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