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Mask for micropattern formation on diamond films

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Abstract

A new technology of forming micropatterned masks for the etching of diamond films is proposed, which makes possible high-precision lithography on the samples with areas up to 104 mm2. A minimum element size that can be achieved is only determined by the level of lithography accessible for silicon-based integrated circuits. The proposed technology can be used in creating unique devices, including biosensor chips for human genome decoding.

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Authors and Affiliations

  1. Lukin State Research Institute for Problems in Physics, Zelenograd, 103460, Russia

    M. E. Belousov, E. A. Il’ichev, A. E. Kuleshov, N. K. Matveeva, P. V. Minakov, G. N. Petrukhin, R. M. Nabiev & G. S. Rychkov

  2. Skobel’tsyn Research Institute of Nuclear Physics, Moscow State University, Moscow, 119992, Russia

    M. E. Belousov, E. A. Il’ichev, A. E. Kuleshov, N. K. Matveeva, P. V. Minakov, G. N. Petrukhin, R. M. Nabiev & G. S. Rychkov

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  1. M. E. Belousov
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  2. E. A. Il’ichev
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  3. A. E. Kuleshov
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  4. N. K. Matveeva
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  5. P. V. Minakov
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  6. G. N. Petrukhin
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  7. R. M. Nabiev
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  8. G. S. Rychkov
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Correspondence to M. E. Belousov.

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Original Russian Text © M.E. Belousov, E.A. Il’ichev, A.E. Kuleshov, N.K. Matveeva, P.V. Minakov, G.N. Petrukhin, R.M. Nabiev, G.S. Rychkov, 2012, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2012, Vol. 38, No. 5, pp. 49–55.

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Belousov, M.E., Il’ichev, E.A., Kuleshov, A.E. et al. Mask for micropattern formation on diamond films. Tech. Phys. Lett. 38, 225–227 (2012). https://doi.org/10.1134/S1063785012030054

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  • DOI: https://doi.org/10.1134/S1063785012030054

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