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Energy dependence of aluminum diffusion in α-Fe under ion irradiation

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Abstract

The process of diffusion in the film-substrate system irradiated by Ar+ ions of various energies is considered. Data on the ion-bombardment-induced variation of the composition of surface layers at the film-substrate interface are presented. Possible mechanisms of the mutual diffusion and anomalously deep intermixing of components caused by the ion implantation are analyzed.

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Authors and Affiliations

  1. Physical Technical Institute, Ural Branch, Russian Academy of Sciences, Izhevsk, Udmurtia, Russia

    A. A. Kolotov, A. A. Novoselov, A. Yu. Drozdov, F. Z. Gilmutdinov & V. Ya. Bayankin

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  1. A. A. Kolotov
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  2. A. A. Novoselov
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  3. A. Yu. Drozdov
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  4. F. Z. Gilmutdinov
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  5. V. Ya. Bayankin
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Correspondence to A. A. Kolotov.

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Original Russian Text © A.A. Kolotov, A.A. Novoselov, A.Yu. Drozdov, F.Z. Gilmutdinov, V.Ya. Bayankin, 2011, published in Pis’ma v Zhurnal Tekhnicheskoĭ Fiziki, 2011, Vol. 37, No. 16, pp. 79–85.

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Kolotov, A.A., Novoselov, A.A., Drozdov, A.Y. et al. Energy dependence of aluminum diffusion in α-Fe under ion irradiation. Tech. Phys. Lett. 37, 780–783 (2011). https://doi.org/10.1134/S1063785011080232

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  • DOI: https://doi.org/10.1134/S1063785011080232

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