Abstract
A new thin-film structure representing the Pt/PZT/SiC/Si system is obtained. The structure comprises a lead zirconate titanate Pb(Zr,Ti)O3 (PZT) film deposited onto thin (90–100 nm) single crystal silicon carbide layers of 3C-SiC and 4H-SiC polytypes grown by a new solid-phase epitaxy on single crystal silicon substrates. Methods used for the formation of this multilayer structure are described, and its structural and dielectric characteristics are presented.
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Original Russian Text © I.P. Pronin, E.Yu. Kaptelov, S.V. Senkevich, V.A. Klimov, N.A. Feoktistov, A.V. Osipov, S.A. Kukushkin, 2008, published in Pis’ma v Zhurnal Tekhnicheskoĭ Fiziki, 2008, Vol. 34, No. 19, pp. 46–52.
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Pronin, I.P., Kaptelov, E.Y., Senkevich, S.V. et al. Thin-film PZT/SiC structure on silicon substrate: Formation, structural features, and dielectric properties. Tech. Phys. Lett. 34, 838–840 (2008). https://doi.org/10.1134/S1063785008100088
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DOI: https://doi.org/10.1134/S1063785008100088