Abstract
The influence of a developed surface relief of an overgrowth (cover) layer modified by anodic oxidation and/or etching on the characteristics of hydrogen-sensitive Pd/GaAs/InGaAs diode heterostructures with quantum wells has been studied. The modified structures exhibit a significant increase in sensitivity and response speed, which is related for the most part to a decrease in the effective distance from the surface, on which atomic hydrogen is chemisorbed, to an elastically strained layer of the InGaAs quantum well. This layer retards the diffusion of hydrogen, which leads to an increase in the hydrogen concentration at the interface.
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Original Russian Text © S.V. Tikhov, I.A. Karpovich, Yu.Yu. Gushchina, L.A. Istomin, 2007, published in Pis’ma v Zhurnal Tekhnicheskoĭ Fiziki, 2007, Vol. 33, No. 15, pp. 69–74.
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Tikhov, S.V., Karpovich, I.A., Gushchina, Y.Y. et al. Effect of a modified cover layer on the properties of hydrogen-sensitive Pd/GaAs/InGaAs diode heterostructures with quantum wells. Tech. Phys. Lett. 33, 661–663 (2007). https://doi.org/10.1134/S1063785007080111
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DOI: https://doi.org/10.1134/S1063785007080111