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Influence of Dopant Incomplete Ionization on the Capacitance of a Reverse-Biased 4H-SiC p+in+ Diode

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Abstract

The transient process in an RC circuit with a reverse-biased 4H-SiC p+in+ diode serving as a capacitor has been numerically simulated using the SILVACO TCAD software environment. The model experiment has shown that the charge time of an optimally designed 4H-SiC p+in+ capacitor with dopant incomplete ionization is roughly an order of magnitude shorter than in the hypothetical case of complete ionization. The potential effect of the dopant ionization dynamics on the transient process has been found.

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References

  1. G. Pensl, F. Ciobanu, T. Frank, M. Krieger, S. Reshanov, F. Schmid, and M. Weidner, Int. J. High Speed Electron. Syst. 15, 705 (2005).

    Article  Google Scholar 

  2. L. B. Elfimov and P. A. Ivanov, Fiz. Tekh. Poluprovodn. (S.-Peterburg) 28, 161 (1994).

    Google Scholar 

  3. T. T. Mnatsakanov, M. E. Levinshtein, L. I. Pomortseva, and S. N. Yurkov, Semiconductors 38, 56 (2004).

    Article  ADS  Google Scholar 

  4. S. Contreras, L. Konczewicz, R. Arvinte, H. Peyre, T. Chassagne, M. Zielinski, and S. Juillaguet, Phys. Status Solidi A 214, 1600679 (2017).

    Article  ADS  Google Scholar 

  5. M. Lades, W. Kaindl, N. Kaminski, E. Niemann, and G. Wachutka, IEEE Trans. Electron Devices 46, 598 (1999).

    Article  ADS  Google Scholar 

  6. W. Kaindl, M. Lades, N. Kaminski, E. Niemann, and G. Wachutka, J. Electron. Mater. 28, 154 (1999).

    Article  ADS  Google Scholar 

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Correspondence to P. A. Ivanov.

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Original Russian Text © P.A. Ivanov, A.S. Potapov, I.V. Grekhov, 2018, published in Zhurnal Tekhnicheskoi Fiziki, 2018, Vol. 88, No. 6, pp. 955–958.

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Ivanov, P.A., Potapov, A.S. & Grekhov, I.V. Influence of Dopant Incomplete Ionization on the Capacitance of a Reverse-Biased 4H-SiC p+in+ Diode. Tech. Phys. 63, 928–931 (2018). https://doi.org/10.1134/S1063784218060130

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  • DOI: https://doi.org/10.1134/S1063784218060130

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