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Planarization of a surface of nanoporous silica–titania composition by atomic-molecular chemical assembly

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Abstract

The processes involved in the planarization of the surface of nanoporous SiO2 by the atomicmolecular deposition of nanoscale TiO2 films were studied in regimes with different degrees of penetration of TiO2 into SiO2 nanopores. The technological process parameters that correspond to different regimes of surface planarization were examined. The degree of penetration of TiO2 into SiO2 nanopores was monitored using reflection ellipsometry by measuring the depth distribution of the refraction index within the two-layer model.

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Correspondence to M. F. Panov.

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Original Russian Text © V.V. Luchinin, M.F. Panov, A.A. Romanov, 2017, published in Zhurnal Tekhnicheskoi Fiziki, 2017, Vol. 87, No. 5, pp. 736–740.

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Luchinin, V.V., Panov, M.F. & Romanov, A.A. Planarization of a surface of nanoporous silica–titania composition by atomic-molecular chemical assembly. Tech. Phys. 62, 755–759 (2017). https://doi.org/10.1134/S1063784217050164

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  • DOI: https://doi.org/10.1134/S1063784217050164

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