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Composition, morphology, and electronic structure of the nanophases created on the SiO2 Surface by Ar+ ion bombardment

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Abstract

The influence of Ar+ bombardment on the composition and the structure of the SiO2/Si surface is studied. A thin Si film is found to form on the SiO2 surface subjected to high-dose ion bombardment.

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Authors and Affiliations

  1. Tashkent State Technical University, ul. Universitetskaya 2, Tashkent, 100095, Uzbekistan

    M. B. Yusupjanova, D. A. Tashmukhamedova & B. E. Umirzakov

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  1. M. B. Yusupjanova
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  2. D. A. Tashmukhamedova
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  3. B. E. Umirzakov
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Correspondence to M. B. Yusupjanova.

Additional information

Original Russian Text © M.B. Yusupjanova, D.A. Tashmukhamedova, B.E. Umirzakov, 2016, published in Zhurnal Tekhnicheskoi Fiziki, 2016, Vol. 86, No. 4, pp. 148–150.

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Yusupjanova, M.B., Tashmukhamedova, D.A. & Umirzakov, B.E. Composition, morphology, and electronic structure of the nanophases created on the SiO2 Surface by Ar+ ion bombardment. Tech. Phys. 61, 628–630 (2016). https://doi.org/10.1134/S1063784216040253

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  • DOI: https://doi.org/10.1134/S1063784216040253

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