Abstract
A new source of an accelerated plasma flow intended for depositing high-quality coatings is described. In this source, a magnetron discharge for cathode target sputtering is combined with a high-voltage discharge with longitudinal oscillation of electrons for ionization of the accrued vapor in which the plasma density is distributed uniformly owing to the application of three-phase ionizer.
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L. P. Veresov, O. L. Veresov, and P. A. Litvinov, Tech. Phys. 35, 490 (2000).
V. T. Barchenko, L. P. Veresov, O. L. Veresov, and S. V. Grigorenko, in Proceedings of the 5th International Conference on Modification of Materials with Particle Beams and Plasma Flows, Tomsk, 2000, pp. 220–223.
L. P. Veresov, O. L. Veresov, Yu. P. Kushakevich, G. F. Petrov, A. F. Chachakov, and I. A. Tsekvava, Vak. Tekh. Tekhnol. 18, 249 (2008).
L. P. Veresov, O. L. Veresov, Yu. P. Kushakevich, A. L. Khuporiya, and A. F. Chachakov, in Proceedings of the 10th International Conference on Films and Coatings, St. Petersburg, 2011, pp. 217–219.
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Original Russian Text © L.P. Veresov, O.L. Veresov, 2016, published in Zhurnal Tekhnicheskoi Fiziki, 2016, Vol. 61, No. 1, pp. 61–69.
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Veresov, L.P., Veresov, O.L. Magnetron source of accelerated plasma flow. Tech. Phys. 61, 59–67 (2016). https://doi.org/10.1134/S1063784216010254
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DOI: https://doi.org/10.1134/S1063784216010254