Abstract
Scanning tunneling microscopy (STM) is used to study the basic laws of growth of ultrathin epitaxial CoSi2(111) films with Co coverages up to 4 ML formed upon sequential deposition of Co and Si atoms taken in a stoichiometric ratio onto the Co–Si(111) surface at room temperature and subsequent annealing at 600–700°C. When the coverage of Co atoms is lower than ~2.7 ML, flat CoSi2 islands up to ~3 nm high with surface structure 2 × 2 or 1 × 1 grow. It is shown that continuous epitaxial CoSi2 films containing 3–4 triple Si–Co–Si layers grow provided precise control of deposition. CoSi2 films can contain inclusions of the local regions with (2 × 1)Si reconstruction. At a temperature above 700°C, a multilevel CoSi2 film with pinholes grows because of vertical growth caused by the difference between the free energies of the CoSi2(111) and Si(111) surfaces. According to theoretical calculations, structures of A or B type with a coordination number of 8 of Co atoms are most favorable for the CoSi2(111)2 × 2 interface.
Similar content being viewed by others
References
C. Pirri, J. C. Peruchetti, D. Bolmont, and G. Gewinner, Phys. Rev. B 33, 4108 (1986).
F. Hellman and R. T. Tung, Phys. Rev. B 37, 10786 (1988).
D. D. Charnbliss, T. N. Rhodin, and J. E. Rowe, Phys. Rev. B 45, 1193 (1992).
A. E. Dolbak, B. Z. Olshanetsky, and S. A. Teys, Surf. Sci. 373, 43 (1997).
U. Starke, J. Schardt, W. Weiss, G. Rangelov, T. H. Fauster, and K. Heinz, Surf. Rev. Lett. 5, 139 (1998).
A. E. Dolbak, B. Z. Olshanetsky, S. A. Teys, and R. A. Zhachuk, Phys. Solid State 41, 1364 (1999).
A. Seuber, J. Schardt, W. Weib, U. Starke, K. Heinz, and Th. Fauster, Appl. Phys. Lett. 76, 727 (2000).
K. J. Kim, T.-H. Kang, K.-W. Kim, H.-J. Shin, and B. Kim, Appl. Surf. Sci. 161, 268 (2000).
M. V. Gomoyunova, I. I. Pronin, D. A. Valdaitsev, and N. S. Faradzhev, Phys. Solid State 43, 569 (1999).
M. V. Gomoyunova, G. S. Grebenyuk, and I. I. Pronin, Tech. Phys. 56, 865 (2011).
S. A. Chambers, S. B. Anderson, H. W. Chen, and J. H. Weaver, Phys. Rev. B 34, 913 (1986).
P. Luches, A. Rota, S. Valeri, I. I. Pronin, D. A. Valdaitsev, N. S. Faradzhev, and M. V. Gomoyunova, Surf. Sci. 511, 303 (2002).
J. M. Gibson, J. L. Batstone, and R. T. Tung, Appl. Phys. Lett. 51, 445 (1987).
A. E. M. Fischer, W. F. J. Slijkerman, K. Nakagawa, R. J. Smith, and J. F. van der Veen, J. Appl. Phys. 64, 3005 (1988).
R. Stalder, H. Sirringhaus, N. Onda, and H. von Kanel, Sur. Sci. 258, 153 (1991).
C. W. T. Bulle-Lieuwma, Appl. Surf. Sci. 68, 1 (1993).
M. F. Chisholm, S. J. Pennycook, R. Jebasinski, and S. Mantl, Appl. Phys. Lett. 64, 2409 (1994).
S. Goncalves-Conto, U. Scharer, E. Muller, H. von Kanel, L. Miglio, and F. Tavazza, Phys. Rev. B 55, 7213 (1997).
H. Von Kanel, Mater. Sci. Rep. 8, 193 (1992).
J. Vrijrnoeth, S. Zaima, E. Vlieg, and J. W. M. Frenken, Phys. Rev. B 45, 6700 (1992).
P. A. Bennett, S. A. Parikh, M. Y. Lee, and D. G. Cahill, Surf. Sci. 312, 377 (1994).
B. Ilge, G. Palasantzas, and J. de Nijs, and L. J. Geerligs, Surf. Sci. 414, 279 (1998).
M. A. K. Zilani, L. Liu, H. Xu, Y. P. Feng, X.-S. Wang, and A. T. S. Wee, J. Phys.: Condens. Matter. 18, 6987 (2006).
R. T. Tung, Mater. Chem. Phys. 32, 107 (1992).
S. P. Murarka, Intermetallics 3, 173 (1995).
D. A. Olyanich, T. V. Utas, A. A. Alekseev, V. G. Kotlyar, A. V. Zotov, and A. A. Saranin, Surf. Sci. 625, 57 (2014).
A. Catana, P. E. Schmid, S. Rieubland, F. Levy, and P. J. Stadelmann, J. Phys.: Condens. Matter. 1, 3999 (1989).
A. Catana, P. E. Schmid, P. Lu, and D. J. Smith, Philos. Mag. A 66, 933 (1992).
H. Von Kanel, C. Schwarz, S. Goncalves-Conto, E. Muller, L. Miglio, F. Tavazza, and G. Malegori, Phys. Rev. Lett. 74, 1163 (1995).
A. P. Horsfield and H. Fujitani, Phys. Rev. B 63, 235303 (2001).
E. G. Moroni, R. Podloucky, and J. Hafner, Phys. Rev. Lett. 81, 1969 (1998).
D. R. Hamann, Phys. Rev. Lett. 60, 313 (1988).
G. Rossi, X. Jin, A. Santaniello, P. DePadova, and D. Chandesris, Phys. Rev. Lett. 62, 191 (1989).
R. T. Tung, J. M. Gibson, and J. M. Poate, Appl. Phys. Lett. 42, 888 (1983).
R. T. Tung and J. M. Gibsonate, Phys. Rev. Lett. 50, 429 (1983).
L. Ruan and D. M. Chen, Appl. Phys. Lett. 72, 3464 (1998).
I. V. Belousov, A. N. Grib, and G. V. Kuznetsov, Semicond. Phys., Quantum Electron. Optoelectron. 9, 29 (2006).
R. T. Tung and J. L. Batstone, Appl. Phys. Lett. 52, 648 (1988).
D. A. Olyanich, T. V. Utas, V. G. Kotlyar, A. V. Zotov, A. A. Saranin, L. N. Romashev, N. I. Solin, and V. V. Ustinov, Appl. Surf. Sci. 292, 954 (2014).
R. J. Phaneuf, Y. Hong, S. Horch, and P. A. Bennett, Phys. Rev. Lett. 78, 4605 (1997).
R. J. Phaneuf, P. A. Bennett, M. Marsi, S. Gunther, L. Gregoratti, L. Casalis, and M. Kiskinova, Surf. Sci. 431, 232 (1999).
J. Vrijmoeth, A. G. Schins, and J. F. van der Veen, Phys. Rev. B 40, 3121 (1989).
S. Walter, F. Blobner, M. Kraus, S. Muller, K. Heinz, and U. Starke, J. Phys.: Condens. Matter. 15, 5207 (2003).
P. J. Van den Hoek, W. Ravenek, and E. J. Baerends, Surf. Sci. 205, 549 (1988).
K. Oura, V. G. Lifshits, A. V. Zotov, A. A. Saranin, and M. Katayama, Surface Science: An Introduction (Springer, Berlin, 2003).
R. T. Tung, J. M. Poate, J. C. Bean, J. M. Gibson, and D. C. Jacobson, Thin Solid Films 93, 77 (1982).
O. A. Utas, T. V. Utas, V. G. Kotlyar, A. V. Zotov, A. A. Saranin, and V. G. Lifshits, Surf. Sci. 596, 53 (2005).
K. Ishibashi, and S. Furukawa, Jpn. J. Appl. Phys. 24, 912 (1985).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © A.A. Alekseev, D.A. Olyanich, T.V. Utas, V.G. Kotlyar, A.V. Zotov, A.A. Saranin, 2015, published in Zhurnal Tekhnicheskoi Fiziki, 2015, Vol. 85, No. 10, pp. 94–100.
Rights and permissions
About this article
Cite this article
Alekseev, A.A., Olyanich, D.A., Utas, T.V. et al. Scanning tunneling microscopy observation of ultrathin epitaxial CoSi2(111) films grown at a high temperature. Tech. Phys. 60, 1508–1514 (2015). https://doi.org/10.1134/S1063784215100023
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063784215100023