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Dissolution of a silver film in silicon glasses under electron bombardment

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Abstract

It is shown that the under the action of an electron beam with electron energy E > 10 keV and electron irradiation dose Q ≥ 20 mQ/cm2 on silicate glasses coated with a silver film 80–100 nm in thickness, the silver film is dissolved partially or completely. The main mechanisms inducing this effect are the formation of a negative space charge under the glass surface, field emission of positive silver ions from the field, and migration of silver ions to the space charge region.

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Authors and Affiliations

  1. St. Petersburg National Research University of Information Technologies, Mechanics, and Optics, Kronverkskii pr. 49, St. Petersburg, 197101, Russia

    V. S. Brunov & A. I. Sidorov

  2. St. Petersburg State Technical University, Politekhnicheskaya ul. 29, St. Petersburg, 195251, Russia

    O. A. Podsvirov & M. A. Prosnikov

Authors
  1. V. S. Brunov
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  2. O. A. Podsvirov
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  3. A. I. Sidorov
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  4. M. A. Prosnikov
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Corresponding author

Correspondence to A. I. Sidorov.

Additional information

Original Russian Text © V.S. Brunov, O.A. Podsvirov, A.I. Sidorov, M.A. Prosnikov, 2014, published in Zhurnal Tekhnicheskoi Fiziki, 2014, Vol. 84, No. 12, pp. 126–131.

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Brunov, V.S., Podsvirov, O.A., Sidorov, A.I. et al. Dissolution of a silver film in silicon glasses under electron bombardment. Tech. Phys. 59, 1863–1868 (2014). https://doi.org/10.1134/S1063784214120032

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  • DOI: https://doi.org/10.1134/S1063784214120032

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