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Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film

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Abstract

A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.

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Correspondence to V. I. Shapovalov.

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Original Russian Text © A.E. Komlev, V.I. Shapovalov, N.S. Shutova, 2012, published in Zhurnal Tekhnicheskoi Fiziki, 2012, Vol. 82, No. 7, pp. 134–136.

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Komlev, A.E., Shapovalov, V.I. & Shutova, N.S. Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film. Tech. Phys. 57, 1030–1033 (2012). https://doi.org/10.1134/S1063784212070122

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  • DOI: https://doi.org/10.1134/S1063784212070122

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