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Properties of low-refractive-index films obtained by the close-spaced vapor transport technique under the sublimation of graphite in a quasi-closed volume

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Abstract

The properties of low-refractive-index carbon films obtained by close-spaced vapor transport at graphite sublimation are studied. The optical properties of the films are investigated by monochromatic multiple-angle ellipsometry, and their morphology is examined by AFM. It is found that the films have a columnar structure with a background surface roughness of about 1 nm. In addition, the surface of the film contains islands up to 50 nm in height with a footprint of ≈200 nm. A low-refractive-index carbon film deposited by close-spaced vapor transport on silicon tips is found to decrease the field emission threshold and drastically raise the current.

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Correspondence to N. V. Sopinskii.

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Original Russian Text © N.V. Sopinskii, V.S. Khomchenko, O.S. Litvin, A.K. Savin, N.A. Semenenko, A.A. Evtukh, V.P. Sobolevskii, G.P. Ol’khovik, 2011, published in Zhurnal Tekhnicheskoi Fiziki, 2011, Vol. 81, No. 11, pp. 125–129.

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Sopinskii, N.V., Khomchenko, V.S., Litvin, O.S. et al. Properties of low-refractive-index films obtained by the close-spaced vapor transport technique under the sublimation of graphite in a quasi-closed volume. Tech. Phys. 56, 1665–1669 (2011). https://doi.org/10.1134/S1063784211110259

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