Abstract
The aerosol deposition of detonation nanodiamonds (DNDs) on a silicon substrate is comprehensively studied, and the possibility of subsequent growth of nanocrystalline diamond films and isolated particles on substrates coated with DNDs is demonstrated. It is shown that a change in the deposition time and the weight concentration of DNDs in a suspension in the range 0.001–1% results in a change in the shape of DND agglomerates and their number per unit substrate surface area N s from 108 to 1011 cm−2. Submicron isolated diamond particles are grown on a substrate coated with DND agglomerates at N s ≈ 108 cm−2 using microwave plasma-enhanced chemical vapor deposition. At N s ≈ 1010 cm−2, thin (∼100 nm) nanodiamond films with a root-mean-square surface roughness less than 15 nm are grown.
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Original Russian Text © N.A. Feoktistov, V.I. Sakharov, I.T. Serenkov, V.A. Tolmachev, I.V. Korkin, A.E. Aleksenskii, A.Ya. Vul’, V.G. Golubev, 2011, published in Zhurnal Tekhnicheskoĭ Fiziki, 2011, Vol. 81, No. 5, pp. 132–138.
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Feoktistov, N.A., Sakharov, V.I., Serenkov, I.T. et al. Aerosol deposition of detonation nanodiamonds used as nucleation centers for the growth of nanocrystalline diamond films and isolated particles. Tech. Phys. 56, 718–724 (2011). https://doi.org/10.1134/S1063784211050112
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DOI: https://doi.org/10.1134/S1063784211050112
Keywords
- Silicon Substrate
- Scanning Probe Microscope
- Weight Concentration
- Aerosol Deposition
- Diamond Phase