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RF exciplex halogen source of UV radiation on an argon-xenon-chlorine mixture

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Abstract

An exciplex halogen source of UV radiation that is excited by an rf transverse discharge is studied experimentally. The active medium of the source is an Ar-Xe-Cl2 mixture kept at a low pressure (100–1000 Pa), and its working spectral range is 220–450 nm. The radiation spectrum contains 235 nm XeCl(D-X), 257 nm Cl2(D′-A′), 306 nm XeCl(B-X), 390 nm XeCl(C-A), and 430 nm XeCl(B-A) lines. The results of optimization of the UV power as a function of the pressure, Ar-Xe-Cl2 mixture composition, and excitation power are reported.

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Authors and Affiliations

  1. Uzhgorod National University, Pidhirna ul. 46, Uzhgorod, 88000, Ukraine

    A. K. Shuaibov, I. V. Shevera & I. A. Grabovaya

Authors
  1. A. K. Shuaibov
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  2. I. V. Shevera
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  3. I. A. Grabovaya
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Original Russian Text © A.K. Shuaibov, I.V. Shevera, I.A. Grabovaya, 2008, published in Zhurnal Tekhnicheskoĭ Fiziki, 2008, Vol. 78, No. 5, pp. 128–130.

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Shuaibov, A.K., Shevera, I.V. & Grabovaya, I.A. RF exciplex halogen source of UV radiation on an argon-xenon-chlorine mixture. Tech. Phys. 53, 658–660 (2008). https://doi.org/10.1134/S1063784208050216

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  • DOI: https://doi.org/10.1134/S1063784208050216

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